Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
Info:
J. Vac. Sci. Technol. A 33(4), Jul/Aug 2015
Author Information
Films
Film/Plasma Properties
Analysis: TEM, Transmission Electron Microscope
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Substrates
Notes
| Oxford Instruments OpAL multifaceted study of plasma A2O3 passivation layer as well as predeposition plasma surface treatments on solar cell performance. |
| 311 |