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Oxford Instruments OpAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments OpAL hardware returned 70 records.

NumberTitle
1Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
2Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
3Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
4Method of Fabrication for Encapsulated Polarizing Resonant Gratings
5Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
6Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
7Gadolinium nitride films deposited using a PEALD based process
8Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
9Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
10Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
11Fabrication and deformation of three-dimensional hollow ceramic nanostructures
12Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
13Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
14Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
15Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
16Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
17On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
18Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
19Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
20A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
21Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
22Encapsulation method for atom probe tomography analysis of nanoparticles
23Breakdown and Protection of ALD Moisture Barrier Thin Films
24High-Reflective Coatings For Ground and Space Based Applications
25Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
26Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
27Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
28High-efficiency embedded transmission grating
29Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
30Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
31'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
32Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
33Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
34Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
35Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
36Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
37Mechanical characterization of hollow ceramic nanolattices
38Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
39Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
40Atomic Layer Deposition of Niobium Nitride from Different Precursors
41Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
42Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
43Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
44Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
45Hafnia and alumina on sulphur passivated germanium
46Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
47Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
48Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
49Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
50Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
51Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
52Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
53Trapped charge densities in Al2O3-based silicon surface passivation layers
54Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
55Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
56Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
57Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
58Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
59Comparative study of ALD SiO2 thin films for optical applications
60Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
61Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
62Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
63Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
64Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes
65Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
66Composite materials and nanoporous thin layers made by atomic layer deposition
67Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
68α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
69Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
70Electrically Excited Plasmonic Nanoruler for Biomolecule Detection