| 1 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
| 2 | Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon |
| 3 | Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation |
| 4 | Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface |
| 5 | High-Reflective Coatings For Ground and Space Based Applications |
| 6 | Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates |
| 7 | Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide |
| 8 | Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD |
| 9 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
| 10 | Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer |
| 11 | Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma |
| 12 | A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density |
| 13 | Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching |
| 14 | Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings |
| 15 | Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell |
| 16 | Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells |
| 17 | Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition |
| 18 | Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2 |
| 19 | Trapped charge densities in Al2O3-based silicon surface passivation layers |
| 20 | α-Ga2O3 grown by low temperature atomic layer deposition on sapphire |
| 21 | Encapsulation method for atom probe tomography analysis of nanoparticles |
| 22 | Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition |
| 23 | High-efficiency embedded transmission grating |
| 24 | Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition |
| 25 | Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition |
| 26 | Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells |
| 27 | Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells |
| 28 | Electrically Excited Plasmonic Nanoruler for Biomolecule Detection |
| 29 | Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3 |
| 30 | Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters |
| 31 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
| 32 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
| 33 | Comparative study of ALD SiO2 thin films for optical applications |
| 34 | Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 35 | Nanowire single-photon detectors made of atomic layer-deposited niobium nitride |
| 36 | Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties |
| 37 | Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells |
| 38 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
| 39 | Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices |
| 40 | Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection |
| 41 | Fabrication and deformation of three-dimensional hollow ceramic nanostructures |
| 42 | Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide |
| 43 | Hafnia and alumina on sulphur passivated germanium |
| 44 | Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications |
| 45 | Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene |
| 46 | Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering |
| 47 | Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma |
| 48 | Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3 |
| 49 | 'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition |
| 50 | Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells |
| 51 | Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition |
| 52 | Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells |
| 53 | Method of Fabrication for Encapsulated Polarizing Resonant Gratings |
| 54 | Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires |
| 55 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 56 | Mechanical characterization of hollow ceramic nanolattices |
| 57 | Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes |
| 58 | Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films |
| 59 | Composite materials and nanoporous thin layers made by atomic layer deposition |
| 60 | Gadolinium nitride films deposited using a PEALD based process |
| 61 | Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor |
| 62 | Atomic Layer Deposition of Niobium Nitride from Different Precursors |
| 63 | Breakdown and Protection of ALD Moisture Barrier Thin Films |
| 64 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
| 65 | Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs |
| 66 | Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3 |
| 67 | On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes |
| 68 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
| 69 | Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film |
| 70 | Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition |
