Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition

Type:
Journal
Info:
Coatings 2017, 7, 118
Date:
2017-08-03
DOI:
http://dx.doi.org/10.3390/coatings7080118

Author Information

Name Institution
Kristin PfeifferFriedrich-Schiller-Universität Jena
Ulrike SchulzFraunhofer Institute for Applied Optics and Precision Engineering
Andreas TünnermannFriedrich-Schiller-Universität Jena
Adriana SzeghalmiFriedrich-Schiller-Universität Jena

Films

Plasma SiO2

Hardware used: Oxford Instruments OpAL
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Plasma Al2O3

Hardware used: Oxford Instruments OpAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Plasma TiO2

Hardware used: Oxford Instruments OpAL
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Thermal Al2O3

Hardware used: Picosun R200
Hydrogen Peroxide, H2O2
CAS#: 7722-84-1
Deposition Temperature = 300C

Thermal Ta2O5

Hardware used: Picosun R200
Ta(OC2H5)5, Ta(OEt)5, Tantalum(V) ethoxide
CAS#: 6074-84-6
Hydrogen Peroxide, H2O2
CAS#: 7722-84-1
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Refractive Index
Analysis: Spectrophotometry
Diagnostic: -

Characteristic: Reflectivity
Analysis: Optical Reflectivity
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Transmittance
Analysis: Optical Transmission
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Substrates

Notes

989