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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 94 record(s).

NumberTitle
1High-efficiency embedded transmission grating
2Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
3The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
4Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
5Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
6Energy-enhanced atomic layer deposition for more process and precursor versatility
7Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
8Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
9Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
10Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
11Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
12Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
13Plasma-enhanced atomic layer deposition of BaTiO3
14Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
15Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
16Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
17Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
18Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
19Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
20Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
21Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
22Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
23Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
24Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
25Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
26Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
27Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
28A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
29Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
30Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
31Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
32Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
33In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
34Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
35Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
36Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
37Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
38Study on the resistive switching time of TiO2 thin films
39Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
40In-gap states in titanium dioxide and oxynitride atomic layer deposited films
41Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
42Low temperature temporal and spatial atomic layer deposition of TiO2 films
43Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
44Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
45Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
46In-gap states in titanium dioxide and oxynitride atomic layer deposited films
47Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
48Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
49Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
50Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
51Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
52Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
53Optical and Electrical Properties of AlxTi1-xO Films
54Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
55Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
56Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
57Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
58Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
59In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
60TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
61Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
62Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
63Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
64The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
65Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
66Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
67Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
68Oxygen migration in TiO2-based higher-k gate stacks
69Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
70Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
71Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
72Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
73Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
74Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
75Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
76Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
77Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
78Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
79Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
80Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
81Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
82Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
83Radical Enhanced Atomic Layer Deposition of Metals and Oxides
84Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
85Plasma-enhanced atomic layer deposition of BaTiO3
86Flexible Memristive Memory Array on Plastic Substrates
87MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
88Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
89Optical and Electrical Properties of TixSi1-xOy Films
90Analysis of nitrogen species in titanium oxynitride ALD films
91Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
92Bipolar resistive switching in amorphous titanium oxide thin film
93Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
94The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films