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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

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TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 94 record(s).

NumberTitle
1Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
2Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
3TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
4MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
5Analysis of nitrogen species in titanium oxynitride ALD films
6Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
7Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
8Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
9Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
10Optical and Electrical Properties of TixSi1-xOy Films
11Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
12Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
13Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
14Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
15Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
16Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
17Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
18Plasma-enhanced atomic layer deposition of BaTiO3
19Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
20Optical and Electrical Properties of AlxTi1-xO Films
21Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
22Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
23Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
24Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
25Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
26In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
27Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
28Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
29Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
30The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
31Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
32Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
33Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
34Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
35Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
36Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
37High-efficiency embedded transmission grating
38Energy-enhanced atomic layer deposition for more process and precursor versatility
39Plasma-enhanced atomic layer deposition of BaTiO3
40Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
41Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
42Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
43Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
44Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
45Low temperature temporal and spatial atomic layer deposition of TiO2 films
46The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
47Study on the resistive switching time of TiO2 thin films
48Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
49Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
50Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
51Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
52Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
53Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
54Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
55Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
56The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
57Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
58Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
59Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
60In-gap states in titanium dioxide and oxynitride atomic layer deposited films
61Radical Enhanced Atomic Layer Deposition of Metals and Oxides
62Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
63Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
64Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
65Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
66Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
67Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
68Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
69Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
70Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
71Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
72Bipolar resistive switching in amorphous titanium oxide thin film
73Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
74Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
75Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
76Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
77Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
78Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79Oxygen migration in TiO2-based higher-k gate stacks
80Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
81In-gap states in titanium dioxide and oxynitride atomic layer deposited films
82Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
83Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
84A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
85Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
86Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
87Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
88In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
89Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
90Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
91Flexible Memristive Memory Array on Plastic Substrates
92Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
93Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
94Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study