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Plasma-enhanced atomic layer deposition of BaTiO3

Type:
Journal
Info:
Scripta Materialia, Volume 111, Pages 106 - 109
Date:
2015-08-23

Author Information

Name Institution
Peter SchindlerStanford University
Youngjun KimStanford University
Dickson ThianStanford University
Jihwan AnStanford University
Fritz B. PrinzStanford University

Films

Plasma BaTiO3


Plasma BaO


Plasma TiO2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Silicon

Notes

517