Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(triisopropyl cyclopentadienyl) barium, Ba(iPr3Cp)2, CAS# 147658-83-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition of BaTiO3
2Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
3Plasma-enhanced atomic layer deposition of BaTiO3