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Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition

Type:
Journal
Info:
Scripta Materialia, Volume 154, Pages 225-229
Date:
2018-05-29
DOI:
https://doi.org/10.1016/j.scriptamat.2018.05.049

Author Information

Name Institution
Jungwan ChoKyung Hee University
Joonsuk ParkStanford University
Fritz B. PrinzStanford University
Jihwan AnStanford University

Films

Plasma BaTiO3

Hardware used: Oxford Instruments FlexAL
Bis(triisopropyl cyclopentadienyl) barium, Ba(iPr3Cp)2
CAS#: 147658-83-1
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: -

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Diagnostic: -

Characteristic: Thermal Conductivity
Analysis: TDTR, Time-Domain ThermoReflectance
Diagnostic: -

Substrates

Silicon

Notes

1539