MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
Info:
Nanomaterials 2020, 10, 338
Author Information
Films
Film/Plasma Properties
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: Raman Spectroscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: I-V, Current-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
Notes