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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

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Beneq TFS-200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-200 hardware returned 69 records.

NumberTitle
1Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
2MANOS performance dependence on ALD Al2O3 oxidation source
3Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
4Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
5Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
6Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
7Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
8Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
9Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
10Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
11Plasma-Modified Atomic Layer Deposition
12Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
13Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
14Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
15In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
16Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
17Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
18Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
19MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
20ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
21Modal properties of a strip-loaded horizontal slot waveguide
22Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
23Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
24Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
25Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
26Low temperature temporal and spatial atomic layer deposition of TiO2 films
27Tribological properties of thin films made by atomic layer deposition sliding against silicon
28Nitride passivation of the interface between high-k dielectrics and SiGe
29Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
30Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
31Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
32Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
33Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
34Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
35Optical properties and bandgap evolution of ALD HfSiOx films
36Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
37Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
38The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
39Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
40Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
41Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
42Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
43Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
44Residual stress study of thin films deposited by atomic layer deposition
45Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
46Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
47Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
48Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
49Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
50Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
51Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
52Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
53Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
54Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
55Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
56Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
57A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
58Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
59Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
60Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
61Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
62Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
63Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
64The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
65Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
66Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
67Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
68Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
69Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride