Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
Info:
Chem. Mater., 2013, 25 (7), pp 1132-1138
Author Information
Films
Film/Plasma Properties
Analysis: TGA, Thermo Gravimetric Analysis
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: XRD, X-Ray Diffraction
Analysis: Four-point Probe
Substrates
Notes
| Considerable physical data of the precursors are presented. |
| The 4,5-dimethyl... precursor did not deposit Cu at the conditions considered while the other precursor did. |
| Gases purified with an Aeronex GateKeeper and Entegris GateKeeper purifiers. |
| 81 |