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Cu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Cu films returned 17 record(s).

Number	Title
1	Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
2	PEALD of Copper using New Precursors for Next Generation of Interconnections
3	Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
4	Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
5	Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
6	Copper-ALD Seed Layer as an Enabler for Device Scaling
7	Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
8	Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
9	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
10	Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
11	Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
12	Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
13	Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
14	Plasma-enhanced atomic layer deposition of Cuâ€“Mn films with formation of a MnSi_xO_y barrier layer
15	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
16	Hydrogen plasma-enhanced atomic layer deposition of copper thin films
17	Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor