Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
Info:
Thin Solid Films 521 (2012) 146-149
Author Information
Films
Film/Plasma Properties
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XRD, X-Ray Diffraction
Analysis: Four-point Probe
Analysis: AES, Auger Electron Spectroscopy
Substrates
Notes