Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

MABOC, bis(1-dimethylamino-2-methyl-2-butoxy) copper(II), Cu(dmamb)2, CAS# 872130-16-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
2Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer