Mn(TMHD)₃, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese, CAS# 14324-99-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s).

Number	Title
1	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
2	Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
3	Atomic layer deposition of YMnO3 thin films
4	Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
5	Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
6	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
7	Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries