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Atomic layer deposition of YMnO3 thin films

Type:
Journal
Info:
Journal of Magnetism and Magnetic Materials 498 (2020) 166146
Date:
2019-11-19
DOI:
https://doi.org/10.1016/j.jmmm.2019.166146

Author Information

Name Institution
Ju H. ChoiKorea Photonics Technology Institute
Calvin D. PhamUniversity of California - Los Angeles (UCLA)
James DormanUniversity of California - Los Angeles (UCLA)
Taeseung KimUniversity of California - Los Angeles (UCLA)
Jane P. ChangUniversity of California - Los Angeles (UCLA)

Films

Plasma YMnO3

Hardware used: Custom Microwave Plasma
tris(2,2,6,6-tetramethyl-3,5-heptanedionato) yttrium Y(tmhd)3
CAS#: 15632-39-0
Mn(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) manganese
CAS#: 14324-99-3
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-88

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Nova 600i Nanolab

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Titan S 80-300 TEM/STEM

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: EXAFS, Extended X-ray Absorption Fine Structure
Diagnostic: Synchrotron

Characteristic: Magnetic Properties
Analysis: SQUID, Superconducting Quantum Interference Device
Diagnostic: Quantum Design MPMS

Substrates

Si(111)
YSZ

Notes

1603