Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Jae-Hyung Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jae-Hyung Park returned 2 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
2Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer