Jong-Wan Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jong-Wan Park returned 10 record(s).

Number	Title
1	Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
2	Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
3	Atomic Layer Deposition of La₂O₃ Thin Films by Using an Electron Cyclotron Resonance Plasma Source
4	Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
5	Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO₂ Buffer Layer
6	Comparison of the Deposition Characteristics and Electrical Properties for La₂O₃, HfO₂ and LHO Films
7	Al₂O₃/TiO₂ multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
8	Plasma-enhanced atomic layer deposition of Cuâ€“Mn films with formation of a MnSi_xO_y barrier layer
9	Deposition of Al₂O₃ by Using ECR-ALD for Organic Substrate Devices
10	Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition