Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 53, No. 4, October 2008, pp. 2123~2128
Date:
2008-10-01
Author Information
| Name | Institution |
|---|---|
| Myoung-Gyun Ko | Hanyang University |
| Woong-Sun Kim | Hanyang University |
| Sang-Kyun Park | Hanyang University |
| Heon-Do Kim | Hanyang University |
| Jong-Wan Park | Hanyang University |
Films
Plasma Ru
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Thermal Stability
Analysis: Anneal
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Substrates
| Silicon |
Notes
| 15 |