Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

4,5-dimethyl-1,3-diisopropyl-imidazol-2-ylidene copper hexamethyldisilazide, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor