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Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition

Type:
Journal
Info:
J. Phys. Chem. C, 2019, 123 (44), pp 27196-27206
Date:
2019-09-24
DOI:
http://dx.doi.org/10.1021/acs.jpcc.9b06473

Author Information

Name Institution
Sabrina WackLuxembourg Institute of Science and Technology
Petru Lunca PopaLuxembourg Institute of Science and Technology
Noureddine AdjeroudLuxembourg Institute of Science and Technology
Jérôme GuillotLuxembourg Institute of Science and Technology
Bianca Rita PistilloLuxembourg Institute of Science and Technology
Renaud LeturcqLuxembourg Institute of Science and Technology

Films

Plasma Ag

Hardware used: Beneq TFS-200
Ag(FOD)(PEt3), Triethylphosphine (6,6,7,7,8,8,8- heptafluoro-2,2- dimethyl-3,5- octanedionate) silver(I)
CAS#: 165461-74-5
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 120-160C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Nova NanoSEM 650

Characteristic: Island Characterization
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Nova NanoSEM 650

Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: FEI Nova NanoSEM 650

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Substrates

Si with native oxide

Notes

1643