About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Plasma-Modified Atomic Layer Deposition

Type:
Conference Proceedings
Info:
68th Annual Gaseous Electronics Conference
Date:
2015-10-13
DOI:
http://meetings.aps.org/link/BAPS.2015.GEC.GT1.165

Author Information

Name Institution
Thomas LarrabeeU.S. Naval Research Laboratory
Sharka M. ProkesU.S. Naval Research Laboratory

Films

Other ZnO

Hardware used: Beneq TFS-200
Deposition Temperature Range N/A

Other VOx

Hardware used: Beneq TFS-200
Deposition Temperature Range N/A

Other HfO2

Hardware used: Beneq TFS-200
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Diagnostic: -

Characteristic: Plasmon Resonances
Analysis: -
Diagnostic: -

Characteristic: Electron Paramagnetic Resonance
Analysis: -
Diagnostic: -

Characteristic: Optical Dispersion
Analysis: -
Diagnostic: -

Characteristic: Mobility
Analysis: -
Diagnostic: -

Characteristic: Carrier Concentration
Analysis: -
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: -
Diagnostic: -

Substrates

Notes

520