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Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications

Type:
Journal
Info:
Japanese Journal of Applied Physics 57, 125502 (2018)
Date:
2018-09-15
DOI:
https://doi.org/10.7567/JJAP.57.125502

Author Information

Name Institution
Zhen ZhuBeneq Oy
Perttu SippolaAalto University
Harri LipsanenAalto University
Hele SavinAalto University
Saoussen MerdesBeneq Oy

Films

Plasma Al2O3

Hardware used: Beneq TFS-200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 90C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: SENTECH SE400adv

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Xpert PRO MPD X-ray Diffractometer

Characteristic: Chemical Composition, Impurities
Analysis: ATR-FTIR
Diagnostic: Thermo Electron Nicolet 380

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)
Diagnostic: Systech Illinois Water permeation analyzer 7001

Substrates

Si(100)
PEN, Polyethylene Napthalate

Notes

1290