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Harri Lipsanen Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harri Lipsanen returned 19 record(s).

NumberTitle
1Properties of AlN grown by plasma enhanced atomic layer deposition
2Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
3Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
4Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
5High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
6Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
7Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
8Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
9Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
10Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
11Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
12Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
13Tribological properties of thin films made by atomic layer deposition sliding against silicon
14Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition
15GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
16Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
17Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
18Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
19Protective capping and surface passivation of III-V nanowires by atomic layer deposition