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Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment

Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-12-08
DOI:
http://dx.doi.org/10.1116/1.4904503

Author Information

Name Institution
Alexander SasinskaUniversity of Cologne
Trilok SinghUniversity of Cologne
Shuangzhou WangUniversity of Cologne
Sanjay MathurUniversity of Cologne
Ralph KraehnertTechnische Universität Berlin

Films

Thermal TiO2

Hardware used: Beneq TFS-200
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range = 120-250C

Other TiO2

Hardware used: Beneq TFS-200
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 120-250C

Film/Plasma Properties

Characteristic: Photoelectrochemical (PEC) Activity
Analysis: Linear Sweep Voltammetry
Diagnostic: Custom

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Surface Science Instruments ESCA M-Probe

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Surface Science Instruments ESCA M-Probe

Characteristic: Photocurrent
Analysis: Photocurrent Measurements
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: STOE & Cie. GmbH XRD

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Nova NanoSEM 430

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL 7401

Characteristic: Resistivity, Sheet Resistance
Analysis: Two-point Probe
Diagnostic: Keithley 6517B

Characteristic: Unknown
Analysis: Raman Spectroscopy
Diagnostic: Renishaw Microspectrometer

Characteristic: Optical Bandgap
Analysis: -
Diagnostic: -

Substrates

FTO, F:SnO2

Notes

Impact of H2 plasma treatment of Beneq TFS 200 thermal ALD TiO2 for photoelectrochemical water splitting.
Beneq TFS-200 used for thermal ALD of TiO2. H2 plasma exposure done on different, unspecified hardware.
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