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Low temperature temporal and spatial atomic layer deposition of TiO2 films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 33, 041512 (2015)
Date:
2015-06-01
DOI:
http://dx.doi.org/10.1116/1.4922588

Author Information

Name Institution
Morteza AghaeeLappeenranta University of Technology
Philipp S. MaydannikLappeenranta University of Technology
Petri JohanssonTampere University of Technology
Jurkka KuusipaloTampere University of Technology
Mariadriana CreatoreEindhoven University of Technology
Tomáš HomolaMasaryk University
David C. CameronMasaryk University

Films

Thermal TiO2

Hardware used: Beneq TFS-200
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range = 80-120C

Thermal TiO2

Hardware used: Beneq TFS-200
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O3, Ozone
CAS#: 10028-15-6
Deposition Temperature Range = 80-120C

Plasma TiO2

Hardware used: Beneq TFS-200
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 80C

Thermal TiO2

Hardware used: Beneq TFS-200R
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range = 80-120C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: -
Diagnostic: Mocon Aquatron Model 1

Substrates

PEN, Polyethylene Napthalate
Si(100)

Notes

370