Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Jurkka Kuusipalo Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jurkka Kuusipalo returned 1 record(s).

NumberTitle
1Low temperature temporal and spatial atomic layer deposition of TiO2 films