Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
Info:
Current Applied Physics Volume 19, Issue 2, 2019, Pages 72-81
Author Information
Films
Film/Plasma Properties
Analysis: XRR, X-Ray Reflectivity
Analysis: XRD, X-Ray Diffraction
Analysis: UV-VIS Spectroscopy
Analysis: AFM, Atomic Force Microscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Substrates
Notes