Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Ga2O3 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Ga2O3 films returned 28 record(s).

NumberTitle
1Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
2Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
3Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
4Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
5Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
6Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
7Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
8α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
9Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
10Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
11Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
12RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
13Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
14Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
15Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
16Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
17Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
18Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
19Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
20Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
21Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
22Plasma enhanced atomic layer deposition of Ga2O3 thin films
23Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
24Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
25Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
26Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
27Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition