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Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition

Type:
Journal
Info:
Chem. Mater. 2020, XXXX, XXX, XXX-XXX
Date:
2020-01-13
DOI:
http://dx.doi.org/10.1021/acs.chemmater.9b03926

Author Information

Name Institution
Virginia D. WheelerU.S. Naval Research Laboratory
Neeraj NepalU.S. Naval Research Laboratory
David R. BorisU.S. Naval Research Laboratory
Syed B. QadriU.S. Naval Research Laboratory
Luke O. NyakitiTexas A&M University College Station
Andrew LangU.S. Naval Research Laboratory
Andrew D. KoehlerU.S. Naval Research Laboratory
Geoffrey FosterU.S. Naval Research Laboratory
Scott G. WaltonU.S. Naval Research Laboratory
Charles R. Eddy, Jr.U.S. Naval Research Laboratory
David J. MeyerU.S. Naval Research Laboratory

Films

Plasma Ga2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMG, trimethyl galium, GaMe3
CAS#: 1445-79-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 265-475C

Plasma Ga2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMG, trimethyl galium, GaMe3
CAS#: 1445-79-0
Ar, Argon
CAS#: 7440-37-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 265-475C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam alpha-SE

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku

Characteristic: Strain
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Technai F20

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: FEI Technai F20

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Fastscan/ICON

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: -
Diagnostic: Lehighton contactless resistivity mapping system

Characteristic: Magnetic Properties
Analysis: SQUID, Superconducting Quantum Interference Device
Diagnostic: Quantum Design MPMS

Substrates

Sapphire

Notes

1428