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Neeraj Nepal Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Neeraj Nepal returned 19 record(s).

NumberTitle
1Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
2Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
3Perspectives on future directions in III-N semiconductor research
4Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
5Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
6Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
7Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
8Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
9Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
10The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
11Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
12Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
13Atomic layer epitaxy for quantum well nitride-based devices
14Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
15Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
16Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
17Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
18Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
19Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition