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Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 40, 062405 (2022)
Date:
2022-08-31
DOI:
http://dx.doi.org/10.1116/6.0002021

Author Information

Name Institution
Jeffrey M. WoodwardU.S. Naval Research Laboratory
Jaan AarikU.S. Naval Research Laboratory
David R. BorisU.S. Naval Research Laboratory
Scooter D. JohnsonSyntek Technologies
Scott G. WaltonU.S. Naval Research Laboratory
Scooter D. JohnsonU.S. Naval Research Laboratory
Zachary R. RobinsonThe College at Brockport SUNY
Neeraj NepalU.S. Naval Research Laboratory
Karl F. Ludwig Jr.Boston University
Jennifer K. HiteU.S. Naval Research Laboratory
Charles R. Eddy, Jr.U.S. Naval Research Laboratory

Films

Plasma InN

Hardware used: Custom Remote Inductively Coupled Plasma
In(CH3)3, InMe3, TriMethyl Indium, TMI
CAS#: 3385-78-2
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Diagnostic: Synchrotron

Characteristic: Island Characterization
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Diagnostic: Synchrotron

Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Diagnostic: Synchrotron

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: -

Characteristic: Electron Density, ne
Analysis: Langmuir Probe
Diagnostic: Custom

Characteristic: Plasma Potential
Analysis: Langmuir Probe
Diagnostic: Custom

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics HR2000+

Substrates

GaN

Notes

Custom beamline ALD setup with G1 Fiji plasma source.
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