Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 51 record(s).

NumberTitle
1Plasma enhanced atomic layer deposition of aluminum sulfide thin films
2Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
3Atomic Layer Deposition of Nanolayered Carbon Films
4Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
5Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
6A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
7Room temperature atomic layer deposition of TiO2 on gold nanoparticles
8Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
9Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
10Sub-nanometer heating depth of atomic layer annealing
11Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
12Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
13Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
14Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
15Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
16Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
17Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
18Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
19Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
20Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
21In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
22Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
23Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
24Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
25Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
26Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
27In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
28AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
29Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
30Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
31Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
32Plasma enhanced atomic layer deposition of zinc sulfide thin films
33Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
34The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
35Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
36AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
37Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
38A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
39Carbon content control of silicon oxycarbide film with methane containing plasma
40Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
41Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
42Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
43Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
44Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
45Experimental and theoretical determination of the role of ions in atomic layer annealing
46Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
47Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
48In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
49Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
50Formation of aluminum nitride thin films as gate dielectrics on Si(100)
51Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation