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Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 51 record(s).

NumberTitle
1Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
2Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
3Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
4A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
5Carbon content control of silicon oxycarbide film with methane containing plasma
6Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
7Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
8Plasma enhanced atomic layer deposition of zinc sulfide thin films
9Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
10Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
11Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
12The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
13Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
14Formation of aluminum nitride thin films as gate dielectrics on Si(100)
15Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
16Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
17A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
18Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
19Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
20Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
21Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
22Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
23Plasma enhanced atomic layer deposition of aluminum sulfide thin films
24Sub-nanometer heating depth of atomic layer annealing
25AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
26In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
27Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
28Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
29Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
30AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
31Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
32Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
33Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
34Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
35Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
36Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
37Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
38Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
39In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
40Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
41Experimental and theoretical determination of the role of ions in atomic layer annealing
42Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
43Atomic Layer Deposition of Nanolayered Carbon Films
44Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
45Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
46In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
47Room temperature atomic layer deposition of TiO2 on gold nanoparticles
48Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
49Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
50Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
51Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes