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Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition

Type:
Journal
Info:
Nanoscale Research Letters 2013, 8:79
Date:
2013-01-04
DOI:
http://dx.doi.org/10.1186/1556-276X-8-79

Author Information

Name Institution
Riyanto EdyDonghua University
Xiaojiang HuangDonghua University
Ying GuoDonghua University
Jing ZhangDonghua University
Jianjun ShiDonghua University

Films

Thermal Al2O3

Hardware used: Custom Direct Capacitively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 90C

Plasma Al2O3

Hardware used: Custom Direct Capacitively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature = 90C

Film/Plasma Properties

Characteristic: Wetting Angle
Analysis: Sessile Drop Tests
Diagnostic: Powereach JC2000A

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi S-4800 Field Emission Scanning Electron Microscope

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi S-4800 Field Emission Scanning Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Digital Instruments Nanoscope IV

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: Thermo Nicolet Nexus 640

Substrates

PET, Polyethylene Terephthalate

Notes

185