Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition

Type:
Journal
Info:
Nanoscale Research Letters 2013, 8:79
Date:
2013-01-04
DOI:
http://dx.doi.org/10.1186/1556-276X-8-79

Author Information

Name Institution
Riyanto EdyDonghua University
Xiaojiang HuangDonghua University
Ying GuoDonghua University
Jing ZhangDonghua University
Jianjun ShiDonghua University

Films

Thermal Al2O3

Hardware used: Custom Direct Capacitively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 90C

Plasma Al2O3

Hardware used: Custom Direct Capacitively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature = 90C

Film/Plasma Properties

Characteristic: Wetting Angle
Analysis: Sessile Drop Tests
Diagnostic: Powereach JC2000A

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi S-4800 Field Emission Scanning Electron Microscope

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi S-4800 Field Emission Scanning Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Digital Instruments Nanoscope IV

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: Thermo Nicolet Nexus 640

Substrates

PET, Polyethylene Terephthalate

Notes

185