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Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition

Type:
Conference Proceedings
Info:
18th International Meeting on Lithium Batteries
Date:
2016-06-20
DOI:
https://ecs.confex.com/ecs/imlb2016/webprogram/Paper76354.html

Author Information

Name Institution
I. I. KazadojevTyndall National Institute, University College Cork
Shane O'BrienTyndall National Institute, University College Cork
M. ModreanuTyndall National Institute, University College Cork
P. OsiceanuInstitute of Physical Chemistry I.G. Murgulescu
S. SomacescuInstitute of Physical Chemistry I.G. Murgulescu
M. ApostolopoulouTechnological Educational Institute of Crete
N. KatsarakisTechnological Educational Institute of Crete
E. KoudoumasTechnological Educational Institute of Crete
D. VernardouTechnological Educational Institute of Crete
Martin E. PembleTyndall National Institute, University College Cork
Ian M. PoveyTyndall National Institute, University College Cork

Films

Thermal VOx

Hardware used: Unknown
TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide
CAS#: 19824-56-7
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range N/A

Plasma VOx

Hardware used: Unknown
TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide
CAS#: 19824-56-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Plasma VOx

Hardware used: Unknown
TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide
CAS#: 19824-56-7
O2, Oxygen
CAS#: 7782-44-7
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Diagnostic: -

Characteristic: Optical Properties
Analysis: -
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: -
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: -
Diagnostic: -

Characteristic: Electrochemical Performance
Analysis: -
Diagnostic: -

Substrates

FTO, F:SnO2

Notes

938