Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide, CAS# 19824-56-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition of titanium vanadium nitride
2Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
3Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
4Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
5Plasma-enhanced atomic layer deposition of titanium vanadium nitride
6Plasma-enhanced atomic layer deposition of vanadium nitride
7Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
8Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
9Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation