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Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films

Type:
Journal
Info:
Wear 523 (2023) 204731
Date:
2022-11-17
DOI:
https://doi.org/10.1016/j.wear.2023.204731

Author Information

Name Institution
Kylie E. Van MeterFlorida State University
Md. Istiaque ChowdhuryLehigh University
Mark J. SowaVeeco Instruments
Alexander Campbell KozenUniversity of Maryland
Tomas GrejtakFlorida State University
Tomas F. BabuskaFlorida State University
Nicholas C. StrandwitzLehigh University
Brandon A. KrickFlorida State University

Films

Plasma TiVN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide
CAS#: 19824-56-7
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 150-350C

Film/Plasma Properties

Characteristic: Friction Coefficient
Analysis: Reciprocating Sliding Test
Diagnostic: Custom

Characteristic: Wear Rate
Analysis: Reciprocating Sliding Test
Diagnostic: Custom

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Stress
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Empyrean

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Empyrean

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Density
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Lucas Labs 302

Substrates

Si with native oxide
SiO2

Notes

1694