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In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 012405 (2020)
Date:
2019-12-12
DOI:
http://dx.doi.org/10.1116/1.5132891

Author Information

Name Institution
Johanna ReifTechnische Universität Dresden
Martin KnautTechnische Universität Dresden
Sebastian KillgeTechnische Universität Dresden
Kristina WinklerTechnische Universität Dresden
Matthias AlbertTechnische Universität Dresden
Johann W. BarthaTechnische Universität Dresden

Films

Plasma Co

Hardware used: FHR-300-ALD
Dicarbonylcyclopentadienylcobalt, CpCo(CO)2
CAS#: 12078-25-0
H2, Hydrogen
CAS#: 1333-74-0
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature Range = 150-250C

Plasma CoN

Hardware used: FHR-300-ALD
Dicarbonylcyclopentadienylcobalt, CpCo(CO)2
CAS#: 12078-25-0
NH3, Ammonia
CAS#: 7664-41-7
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature = 200C

Plasma CoN

Hardware used: FHR-300-ALD
Dicarbonylcyclopentadienylcobalt, CpCo(CO)2
CAS#: 12078-25-0
NH3, Ammonia
CAS#: 7664-41-7
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 200C

Plasma CoN

Hardware used: FHR-300-ALD
Dicarbonylcyclopentadienylcobalt, CpCo(CO)2
CAS#: 12078-25-0
H2, Hydrogen
CAS#: 1333-74-0
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 200C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: -

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Si with native oxide

Notes

1566