Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Dicarbonylcyclopentadienylcobalt, CpCo(CO)2, CAS# 12078-25-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s).

NumberTitle
1In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
2Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
3High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
4In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
5Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
6Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
7High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
8Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
9Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl