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Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]

Type:
Journal
Info:
Japanese Journal of Applied Physics 46, L173 (2007)
Date:
2006-12-06
DOI:
https://doi.org/10.1143/JJAP.46.L173

Author Information

Name Institution
Keunjun KimHanyang University
Keunwoo LeeHanyang University
Sejin HanHanyang University
Taeyong ParkHanyang University
Youngjin LeeHynix Semiconductor
Jeongtae KimHynix Semiconductor
Seungjin YeomHynix Semiconductor
Hyeongtag JeonHanyang University

Films

Plasma Co

Hardware used: Custom
Dicarbonylcyclopentadienylcobalt, CpCo(CO)2
CAS#: 12078-25-0
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 50-250C

Plasma Co

Hardware used: Custom
Dicarbonylcyclopentadienylcobalt, CpCo(CO)2
CAS#: 12078-25-0
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 50-250C

Plasma Co

Hardware used: Custom
dicobalt octacarbonyl, Co2(CO)8
CAS#: 10210-68-1
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 50-200C

Plasma Co

Hardware used: Custom
dicobalt octacarbonyl, Co2(CO)8
CAS#: 10210-68-1
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 50-200C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Substrates

Notes

1012