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Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode

Type:
Journal
Info:
2015 Nanotechnology 26 094001
Date:
2015-01-06
DOI:
http://dx.doi.org/10.1088/0957-4484/26/9/094001

Author Information

Name Institution
Cao GuanNational University Singapore
Xu QianNanjing University
Xinghui WangNanyang Technological University
Yanqiang CaoNanjing University
Qing ZhangNanyang Technological University
Aidong LiNanjing University
John WangNational University Singapore

Films

Plasma CoOx

Hardware used: Picosun R200
Dicarbonylcyclopentadienylcobalt, CpCo(CO)2
CAS#: 12078-25-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Ultra 60 FE-SEM

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2010F

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry
Diagnostic: Solartron 1470E

Substrates

CNTs, Carbon NanoTubes
Carbon Cloth
Silicon

Notes

Picosun SUNALE R200 PEALD Co3O4 for supercapacitor application.
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