Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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FHR-300-ALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using FHR-300-ALD hardware returned 2 records.

NumberTitle
1In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
2In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films