Experimental and theoretical determination of the role of ions in atomic layer annealing
Type:
Journal
Info:
J. Mater. Chem. C, 2022, 10, 5707-5715
Date:
2022-02-25
Author Information
| Name | Institution |
|---|---|
| Scott Toshio Ueda | University of California - San Diego |
| Aaron McLeod | University of California - San Diego |
| Youhwan Jo | University of Texas at Dallas |
| Zichen Zhang | University of California - San Diego |
| Jacob Spiegelman | University of California - San Diego |
| Jeff Spiegelman | RASIRC, Inc. |
| Dan Alvarez | RASIRC, Inc. |
| Daniel Moser | EMD Performance Materials |
| Ravi Kanjolia | EMD Performance Materials |
| Mansour Moinpour | EMD Performance Materials |
| Jacob Woodruff | EMD Performance Materials |
| Kyeongjae Cho | University of Texas at Dallas |
| Andrew C. Kummel | University of California - San Diego |
Films
Other AlN
Other AlN
Other AlN
Other AlN
Hardware used: Simulation
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Substrates
| Si(111) |
Notes
| 1686 |