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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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3DMAAl, (Me2N)3Al, (Me2N)6Al2, Tris (DiMethylAmido) Aluminum(III), CAS# 32093-39-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s).

NumberTitle
1Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
2Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
3Experimental and theoretical determination of the role of ions in atomic layer annealing
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs