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A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition

Type:
Journal
Info:
Technical Physics, 2021, Vol. 66, No. 4, pp. 655-660.
Date:
2020-11-06
DOI:
https://doi.org/10.1134/S1063784221040174

Author Information

Name Institution
Max V. ShibalovRussian Academy of Sciences
N. V. PorokhovRussian Academy of Sciences
A. M. MumlyakovRussian Academy of Sciences
I. V. TrofimovRussian Academy of Sciences
G. D. Dyud’binRussian Academy of Sciences
E. R. TimofeevaRussian Academy of Sciences
A. M. TagachenkovRussian Academy of Sciences
Y. V. AnufrievRussian Academy of Sciences
E. V. ZenovaRussian Academy of Sciences
Michael A. TarkhovRussian Academy of Sciences

Films

Plasma NbN

Hardware used: Oxford Instruments FlexAL
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
H2, Hydrogen
CAS#: 1333-74-0
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature = 350C

Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: 4D 280 4 Point Probe

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: -

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Critical Temperature
Analysis: -
Diagnostic: -

Characteristic: Critical Current Density
Analysis: -
Diagnostic: -

Substrates

SiO2

Notes

1678