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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

TBTDEN, Tris(diethylamido)(tert-butylimido)niobium, CAS# 210363-27-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 20 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition of superconducting niobium nitride
2RF Characterization of Novel Superconducting Materials and Multilayers
3Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
4RF Characterization of Novel Superconducting Materials and Multilayers
5A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
6Atomic Layer Deposition of Niobium Nitride from Different Precursors
7Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
8Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
9Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
10Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
11Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
12Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
13Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
14Performance of Samples with Novel SRF Materials and Growth Techniques
15Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
16Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
17Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
18Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
19Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
20In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications