Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
Type:
Journal
Info:
Journal of Low Temperature Physics volume 199, pages 875-882 (2020)
Date:
2020-01-13
Author Information
| Name | Institution |
|---|---|
| Calder Sheagren | University of Chicago |
| Peter S. Barry | Argonne National Laboratory |
| Erik Shirokoff | University of Chicago |
| Qing Yang Tang | University of Chicago |
Films
Plasma NbN
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
CAS#: 210363-27-2
CAS#: 7727-37-9
CAS#: 1333-74-0
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Custom
Characteristic: Superconductivity
Analysis: Custom
Characteristic: Quality Factor
Analysis: Custom
Characteristic: Kinetic Inductance
Analysis: Custom
Substrates
| Si(100) |
Notes
| 1560 |