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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires

Type:
Journal
Info:
Applied Physics Letters 118, 191106 (2021)
Date:
2021-04-30

Author Information

Name Institution
Gregor G. TaylorUniversity of Glasgow
Dmitry V. MorozovUniversity of Glasgow
Ciaran T. LennonUniversity of Glasgow
Peter S. BarryArgonne National Laboratory
Calder SheagrenUniversity of Chicago
Robert H. HadfieldUniversity of Glasgow

Films

Plasma NbN


Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Photoresponse
Analysis: SNSPDs, Superconducting nanowire single-photon detectors

Substrates

Si(100)

Notes

1695