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Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Supercond. Sci. Technol. 26 025008, 2013
Date:
2012-11-23
DOI:
http://dx.doi.org/10.1088/0953-2048/26/2/025008

Author Information

Name Institution
Mario ZieglerLeibniz Institute of Photonic Technology
Ludwig FritzschLeibniz Institute of Photonic Technology
Julia DayLeibniz Institute of Photonic Technology
Sven LinzenLeibniz Institute of Photonic Technology
Solveig AndersLeibniz Institute of Photonic Technology
Julia ToussaintLeibniz Institute of Photonic Technology
Hans-Georg MeyerLeibniz Institute of Photonic Technology

Films

Plasma NbN

Hardware used: Oxford Instruments OpAL
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 200-400C

Film/Plasma Properties

Characteristic: Critical Temperature
Analysis: Four-point Probe
Diagnostic: Custom

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Custom

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Thickness
Analysis: Profilometry
Diagnostic: Dektak

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Substrates

Al2O3

Notes

629