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Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition

Type:
Journal
Info:
IEEE Transactions on Applied Superconductivity (Volume: 27, Issue: 4, June 2017)
Date:
2017-01-19
DOI:
http://dx.doi.org/10.1109/TASC.2017.2655719

Author Information

Name Institution
M. UkibeNational Institute of Advanced Industrial Science and Technology
G. FujiiNational Institute of Advanced Industrial Science and Technology

Films

Plasma NbN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku Ultima X

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Shimadzu SFT-4500

Characteristic: Superconductivity
Analysis: -
Diagnostic: Gifford McMahon (GM) refrigerator

Substrates

Sapphire

Notes

1026