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Plasma enhanced atomic layer deposition of aluminum sulfide thin films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A113 (2018)
Date:
2017-11-08
DOI:
http://dx.doi.org/10.1116/1.5003339

Author Information

Name Institution
Jakob KuhsGhent University
Zeger HensGhent University
Christophe DetavernierGhent University

Films

Plasma AlS

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature Range = 90-350C

Plasma AlS

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 90-350C

Thermal AlS

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
Deposition Temperature = 90C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Discover

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics QE Pro

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Hiden HPR-30

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Discover

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Substrates

SiO2
Micropillar Arrays

Notes

1045